laser lithography

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• laser lithography — lazerinė litografija statusas T sritis radioelektronika atitikmenys: angl. laser lithography vok. Laserlithografie, f rus. лазерная литография, f pranc. lithographie laser, f …   Radioelektronikos terminų žodynas

• Láser excimer — Láser de excímeros, empleado en cirugía oftalmológica para tratamientos LASIK. Equipamiento de la marca Carl Zeiss. El láser de excímeros, láser excimer (calco del inglés) o láser exciplex, es un tipo de láser ultravioleta utilizado… …   Wikipedia Español

• Láser de fluoruro de kriptón — Este artículo trata sobre el láser excímero. Para obtener información general acerca del compuesto químico Difluoruro de kriptón, véase Difluoruro de kriptón. Este artículo trata sobre el láser excímero. Para obtener información general acerca… …   Wikipedia Español

• Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges …   Wikipedia

• Laser printer — HP LaserJet 4200 series printer, installed atop high capacity paper feeder …   Wikipedia

• Multiphoton lithography — (also known as direct laser lithography or direct laser writing) of polymer templates has been known for years by the photonic crystal community. Similar to standard photolithography techniques, structuring is accomplished by illuminating… …   Wikipedia

• lithographie laser — lazerinė litografija statusas T sritis radioelektronika atitikmenys: angl. laser lithography vok. Laserlithografie, f rus. лазерная литография, f pranc. lithographie laser, f …   Radioelektronikos terminų žodynas

• Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …   Wikipedia

• Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is …   Wikipedia

• Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia

• Interference lithography — (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. Basic principleThe basic principle is the same as in interferometry or holography. An… …   Wikipedia